The RIE-800iPB was used to form a 450 μm deep pillar with a 30 μm square pattern. It is processed from top to bottom without any film peeling.
Photo courtesy of Taiwan university
Processes450 μm deep pillar formation
The RIE-800iPB was used to form a 450 μm deep pillar with a 30 μm square pattern. It is processed from top to bottom without any film peeling.
Photo courtesy of Taiwan university